PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

• Main Authors: YAMAMOTO HIDEYUKI, KANNO SEIICHIRO, NISHIO RYOJI, TANAKA JUNICHI, KITSUNAI HIROYUKI
• Format: Patent
• Language: English; Korean
• Published: 28.03.2002
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR RELEVANT APPARATUS; TRANSPORTING

PURPOSE: A monitoring system is provided to exactly capture a state change of a plasma-processing apparatus. CONSTITUTION: The plasma-processing apparatus includes a processing chamber(1) for processing samples. The plasma-processing apparatus is provided with a state-detecting means which detects a processing state inside of the chamber(1) and outputs a plurality of output signal and signal conversion portions(9a,9b) which produce an arbitrary number of apparatus-state signal composed of an arbitrary number of signal-processing filter taken out from a data base(10) collecting signals filters by a means for selecting a signal filter, and the signal conversion portions produce the apparatus-state signal having a time series of signal less than the output signal from the output signal. 본 발명은 시료를 처리하는 처리챔버(1)를 가지는 플라즈마처리장치에 있어서, 챔버 내부의 처리상태를 검출하여 복수의 출력신호를 출력하는 상태검출수단과, 신호필터를 모은 데이터베이스로부터 신호필터 선택수단에 의해 임의의 수의 신호처리필터를 인출하여 구성되고, 임의의 수의 장치상태 신호를 생성하는 신호변환부를 구비하고, 상기 신호변환부에 있어서 상기 출력신호로부터 그 출력신호보다 적은 수의 시계열을 가지는 상기 장치상태 신호를 생성하는 것을 특징으로 하는 플라즈마처리장치이다.