PUMPING SYSTEM OF APPARATUS FOR FABRICATING SEMICONDUCTOR

PURPOSE: A pumping system of an apparatus for fabricating a semiconductor is provided to minimize generation of powder in an exhaust line through which exhaust gas is exhausted, by preventing the temperature of the exhaust gas from being decreased. CONSTITUTION: A predetermined process is performed...

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Bibliographic Details
Main Author CHOI, CHEOL HWAN
Format Patent
LanguageEnglish
Korean
Published 28.03.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A pumping system of an apparatus for fabricating a semiconductor is provided to minimize generation of powder in an exhaust line through which exhaust gas is exhausted, by preventing the temperature of the exhaust gas from being decreased. CONSTITUTION: A predetermined process is performed regarding a wafer in a process chamber(130). The exhaust line(110) is connected to the process chamber. A dry pump(112) is installed in the exhaust line. A powder transfer(114) sprays nitrogen gas in the direction that the exhaust gas flows to increase the flow rate of the exhaust gas, installed in the exhaust line. A supply line supplies hot nitrogen gas to the powder transfer.
Bibliography:Application Number: KR20000055513