Resist Composition and Patterning Process
PURPOSE: To provide a chemical amplification positive type resist material having high contrast between the velocity of alkali dissolution before exposure and that after exposure, high sensitivity, high resolution, a good pattern shape after exposure, superior etching resistance and superior adaptab...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
21.02.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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