LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

• Main Author: BISSCHOPS THEODORUS HUBERTUS JOSEPHUS
• Format: Patent
• Language: English; Korean
• Published: 15.02.2002
• Edition: 7
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithographic projection apparatus is provided to better maintain isotherm of its components. CONSTITUTION: A lithographic apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame on which position sensors for at least one of the patterning structure and substrate are mounted, a vacuum chamber enclosing at least one component selected from a group comprising the support structure, the substrate table, the projection system and the isolated reference frame and at least one temperature control member that at least partially surrounds one of the components in the vacuum chamber, the temperature control member being at least partly formed of a material having at least partly a substantially absorption and emission-inhibiting surface finish for keeping the one component substantially isothermal during operation. 둘러싸여진 구성요소의 온도를 제어하기 위하여 마스크 및 기판 테이블(MT, WT), 투영 시스템(PL) 및 격리된 기준 프레임(MF)을 포함하는 그룹으로 부터 선택된 적어도 하나의 구성요소를 적어도 부분적으로 둘러싸는 적어도 하나의 온도 제어 부재(VC, TE, TB)를 포함하는 리소그래피 장치. 상기 부재의 표면 마감재는 작동하는 동안 부분적으로 둘러싼 구성요소가 등온을 유지하는 것을 돕기 위해 선택된다.