STRUCTURE OF PELLICLE FOR PREVENTING POLLUTION OF RETICLE

PURPOSE: A structure of a pellicle for preventing pollution of a reticle is provided to protect a reticle and a semiconductor wafer and prevent pollution of the reticle by improving a structure of pellicle adhered to the reticle. CONSTITUTION: A pellicle is formed with a membrane(1), a frame(2), a f...

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Bibliographic Details
Main Author LEE, SEOK RYEOL
Format Patent
LanguageEnglish
Korean
Published 26.01.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A structure of a pellicle for preventing pollution of a reticle is provided to protect a reticle and a semiconductor wafer and prevent pollution of the reticle by improving a structure of pellicle adhered to the reticle. CONSTITUTION: A pellicle is formed with a membrane(1), a frame(2), a filter, and an adhesive member(5). The membrane(1) has thin thickness to maintain transparency and strong intensity to cover a whole surface of the frame(2). One side of the frame(2) is adhered to the membrane(1). The other side of the frame(2) is adhered to the adhesive member(5). The adhesive member(5) is adhered to a chrome side of a reticle. An adhesive material(9) is formed on a contact portion of the frame(2) and the reticle of the adhesive member(5). A sponge(11) having micro holes(10) is formed on a center portion of the adhesive member(5).
Bibliography:Application Number: KR20000040599