LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

• Main Authors: VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS, FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS, LOOPSTRA ERIK ROELOFF
• Format: Patent
• Language: English; Korean
• Published: 23.01.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithographic projection apparatus including a projection system proving a projection beam of radiation and/or an active reflector containing at least one actuator in a radiation system is provided which permits improved control of a surface shape and wavefront aberrations. CONSTITUTION: The lithographic projection apparatus comprises: a radiation system(Ex, IL) providing a projection beam(PB) of radiation; a supporting assembly supporting a patterning means; a substrate table(WT) fixing a substrate(W); a projection system(IL) projecting a patterned beam on a target area of the substrate; and an active reflector containing a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer. The actuator may be operative to apply torques to the reflector. 리소그래피 투영장치는 방사선 투영빔을 제공하는 방사선 시스템 및/또는 투영 시스템내에 액티브 반사기를 포함하고, 상기 액티브 반사기는 본체부재, 반사 다중층 및 상기 반사 다중층의 표면 형상을 조정하도록 제어할 수 있는 적어도 하나의 액추에이터를 포함하고, 여기서, 액추에이터는 상기 반사 다중층의 표면 형상에 평행한 방향으로 실질적인 힘의 분력을 가한다. 상기 액추에이터는 상기 반사기에 토크를 가하도록 작동할 수 있다.