LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD DEVICE MANUFACTURED THEREBY AND GAS COMPOSITION

• Main Authors: BEEMS MARCEL HENDRIKUS MARIA, PRIL WOUTER ONNO, VAN DE PASCH ENGELBERTUS ANTONIUS FRANCISCUS, HENSHAW PHILIP DENNIS
• Format: Patent
• Language: English; Korean
• Published: 23.01.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PURPOSE: A lithographic projector is provided to accurately obtain a position of a movable table in the projector, by using two or more color interferometer devices by an arbitrary selection. CONSTITUTION: The apparatus comprises flushing gas means for supplying purge gas to a space accommodating at least a part of the movable table, the purge gas being selected such that leakage of the purge gas into the area of operation of the interferometric devices does not cause significant error in the interferometric measurements. 장치내의 이동가능한 테이블의 위치를 정확하게 결정하기 위해서 하나 및 선택적으로 두개 이상 색조의 간섭계 디바이스도 이용할 수 있는 리소그래피 장치. 상기 장치는 적어도 상기 이동가능한 테이블의 일부를 수용하는 공간에 간섭계 디바이스의 작동 구역내로 정화 개스가 누출되었을때 간섭계 측정에 심각한 오차를 야기하기 않기위해 선택된 정화 개스를 공급하기 위한 플러싱 개스 수단을 포함한다.