IMPROVED ION IMPLANTING EQUIPMENT

PURPOSE: An improved ion implanting equipment is provided to prevent a high voltage arcing and a damage of a tube by installing an insulation shielding unit in an exhaust tube hole. CONSTITUTION: The ion implanting equipment comprises a housing(10) and a terminal(12) formed in the housing(10). The h...

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Bibliographic Details
Main Author KIM, HYEONG YONG
Format Patent
LanguageEnglish
Korean
Published 29.10.2001
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An improved ion implanting equipment is provided to prevent a high voltage arcing and a damage of a tube by installing an insulation shielding unit in an exhaust tube hole. CONSTITUTION: The ion implanting equipment comprises a housing(10) and a terminal(12) formed in the housing(10). The housing(10) and the terminal(12) are isolated each other via an insulator. A gas box(14) and a pump(16) is located in the terminal(12). The gases existed in the terminal(12) are exhausted by the pump(16) through an exhaust tube(20) passing the terminal(12) and the housing(10). Isolation shielding units(22a,22b) are installed in hole portions of the exhaust tube(20) passed the housing(10) and the terminal(12), respectively.
Bibliography:Application Number: KR20000016111