POSITIVE PHOTORESIST CONTAINING CROSS-LINKED POLYMER

• Main Authors: PANDYA ASHISH A, VARANASI PUSHKARA R, SINTA ROGER F, CORNETT KATHLEEN, ADAMS TIMOTHY G, RAJARATNAM MARTHA M, KATNANI AHMAD D
• Format: Patent
• Language: English; Korean
• Published: 26.09.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

PURPOSE: Provided are a novel cross-linked polymer and a chemically amplified positive photo-resist composition containing the cross-linked polymer together with any photo-active component to provide a superior lithographic result, compared to corresponding composition without the cross-linked polymer. CONSTITUTION: The positive photo-resist composition comprises groups cross-linked and/or active to the cross-linkage; and non-aromatic photoacid-unstable groups. At least part of the groups contains polymers cross-linked to other polymer units and any of photo-active component. The polymer contains phenol units, at least part of which is covalent-bonded with another phenol units of the same or alternative polymer chains. The polymer comprises acrylate photoacid-unstable groups including acrylate ester having tertiary non-cyclic alkyl groups or bi- or tertiary-alicyclic groups. The photoacid acrylate ester is t-butyl or adamantyl.