METHOD FOR CARRYING SEMICONDUCTOR DEVICE
PURPOSE: A method for carrying a semiconductor device is provided to prevent a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch. CONSTITUTION: An apparatus for carrying a semiconductor wafer includes an actuator, an...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
05.02.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A method for carrying a semiconductor device is provided to prevent a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch. CONSTITUTION: An apparatus for carrying a semiconductor wafer includes an actuator, an upper arm(202), a forearm(204), and a vacuum line(208). The actuator provides a power. The upper arm includes the first and second stages, and the first stage is connected to the actuator. The forearm includes a first stage connected to the second stage of the upper arm, and a second stage for holding the semiconductor wafer. The vacuum line is extended from the first stage of the upper arm to the second stage of the forearm, and passes through the forearm. Thereby, a semiconductor device prevents a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch. |
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Bibliography: | Application Number: KR19990028924 |