METHOD FOR CARRYING SEMICONDUCTOR DEVICE

PURPOSE: A method for carrying a semiconductor device is provided to prevent a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch. CONSTITUTION: An apparatus for carrying a semiconductor wafer includes an actuator, an...

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Bibliographic Details
Main Authors PARK, HUI JEONG, PARK, JAE GU
Format Patent
LanguageEnglish
Korean
Published 05.02.2001
Edition7
Subjects
Online AccessGet full text

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Summary:PURPOSE: A method for carrying a semiconductor device is provided to prevent a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch. CONSTITUTION: An apparatus for carrying a semiconductor wafer includes an actuator, an upper arm(202), a forearm(204), and a vacuum line(208). The actuator provides a power. The upper arm includes the first and second stages, and the first stage is connected to the actuator. The forearm includes a first stage connected to the second stage of the upper arm, and a second stage for holding the semiconductor wafer. The vacuum line is extended from the first stage of the upper arm to the second stage of the forearm, and passes through the forearm. Thereby, a semiconductor device prevents a particle generation in a fabrication process by not using adhesive material, and prevents a byproduct contamination such as a scratch.
Bibliography:Application Number: KR19990028924