WAVELENGTH MONITORING DEVICE FOR EXCIMER LASER LIGHT FOR EXPOSING SEMICONDUCTOR

• Main Authors: SEKI TADAHIRA, KOBAYASHI TAKAO, HOTTA KAZUAKI
• Format: Patent
• Language: English; Korean
• Published: 26.01.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; COLORIMETRY; DEVICES USING STIMULATED EMISSION; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RADIATION PYROMETRY; SEMICONDUCTOR DEVICES; TESTING

PURPOSE: To simultaneously measure a standard laser beam and an excimer laser beam for exposing semiconductor with high accuracy and without time lag. CONSTITUTION: A wavelength monitoring device is composed of incident-side optical systems 21 and 22, which respectively forms a laser beam from an ex...