VERTICAL FURNACE HAVING GAS SUPPLY NOZZLE HAVING PIECE FOR PREVENTING BENDING

• Main Authors: SEO, HO GEUN, BAEK, SEUNG CHANG
• Format: Patent
• Language: English; Korean
• Published: 05.06.2000
• Edition: 7
• Subjects: BLASTING; FURNACES; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; HEATING; KILNS; LIGHTING; MECHANICAL ENGINEERING; OPEN SINTERING OR LIKE APPARATUS; OVENS; RETORTS; WEAPONS

PURPOSE: A vertical furnace for the preparation of a semiconductor device is provided to prevent the bending of a nozzle installed to supply reacting gas needed for process into an inner tube. CONSTITUTION: A vertical furnace is composed of an inner tube(120) to receive a boat(110) loading a wafer for the preparation of a semiconductor device, an outer tube(140) installed by surrounding the inner tube and a nozzle(130) extended near to the upper end portion(120A) of the inner tube in the same direction as the extended direction of the inner tube in the inner tube and to supply reacting gas needed for the semiconductor device preparation process into the inner tube. The nozzle is extended in a pipe shape having 500-3000mm of length in the inner tube. The nozzle is combined to the upper end portion of the nozzle and has a bending preventing piece. The bending preventing piece(130A) has a combining portion(130B) combined to the upper end portion of the inner tube to install the nozzle while keeping a certain distance(D) from the inner tube. 휨 방지 수단이 설치된 가스 공급 노즐을 갖춘 반도체 제조용 버티칼 퍼니스에 관하여 개시한다. 본 발명에 따른 버티칼 퍼니스는 웨이퍼가 로딩된 보트를 수용하기 위한 내측 튜브와, 상기 내측 튜브를 포위하여 설치된 외측 튜브와, 상기 내측 튜브 내에서 상기 내측 튜브의 연장 방향과 동일한 방향으로 상기 내측 튜브의 상단부 근방까지 연장되어 상기 내측 튜브 내에 상기 반도체 제조 공정에 필요한 반응 가스를 공급하기 위한 노즐과, 상기 노즐의 상단부에 결합되어 상기 노즐이 휘는 것을 방지하기 위한 휨 방지 수단을 갖춘다.