PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE PHOSPHOR PASTE COMPOSITION AND PRODUCTION PROCESS OF FLUORESCENCE FILM

• Main Authors: OH, HYEON SIK, PARK, I SOON
• Format: Patent
• Language: English; Korean
• Published: 15.03.2000
• Edition: 7
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DYES; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE: A photosensitive fluorescent paste is provided which can be developed with pure water and burned at low temperature to make the production process of the fluorescence film simple. CONSTITUTION: A photopolymerization type photosensitive phosphor paste composition contains:1-15 wt.% of binder polymer, 3-7 wt.% of multifunctional monomer or oligomer, 1-3 wt.% of photoinitiator, 25-35 wt.% of one fluorescence material among red, green and blue, 20-35 wt.% of solvent which dissolves the binder polymer and 0.1-1 wt.% of dispersion agent, lubricant or photosensitizer. The production process of the fluorescence film is as follows:(1) applying the paste composition on the glassy base plate to a thickness of 30-70 micrometer;; (2) heating and drying for 10-30 minutes to the temperature of 100-140°C; (3) exposing to light for 20-60 seconds; (4) developing the film of exposed glassy plate to produce a first fluorescent film; (5) repeating the process from (1) to (4) to produce a second film and again repeating the same steps to produce a third film; and (6) burning the produced glassy plate to the temperature of 450-550°C. 본 발명은 평판표시장치(Flat panel display)의 하나인 플라즈마 디스플레이 패널(Plasma display panel)의 형광막을 형성하는 데 유용한 광중합형 감광성 형광체 페이스트 조성물(Photopolymerization type photosensitive phosphor paste composition) 및 이를 이용한 형광막의 형성방법에 관한 것이다. 본 발명에 따른 광중합형 감광성 형광체 페이스트 조성물은 형광체, 바인더 고분자(Binder polymer), 다관능성 올리고머(Multifunctional oligomer) 혹은 모노머, 자외선광개시제, 용제, 첨가제 및 분산제를 포함하여 이루어지며, 이는 알칼리 수용액으로 현상하는 종래의 감광성 형광체 페이스트와 달리 순수로 현상이 가능하기 때문에 환경친화적이며, 또한 소성온도가 낮아 형광막 형성공정이 용이하여 40인치 이상 대화면, 고정세 플라즈마 디스플레이 패널의 형광막 형성에 적합하다는 효과가 있다.