Composition for suppressing skin irritation

• Main Authors: CHO SI YOUNG, PARK WONSEOK, SON EUIDONG, KIL INSUP, HONG YONG DEOG
• Format: Patent
• Language: English; Korean
• Published: 06.01.2023
• Subjects: FOODS OR FOODSTUFFS; FOODS, FOODSTUFFS, OR NON-ALCOHOLIC BEVERAGES, NOT COVERED BYSUBCLASSES A23B - A23J; HUMAN NECESSITIES; HYGIENE; MEDICAL OR VETERINARY SCIENCE; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES; PRESERVATION OF FOODS OR FOODSTUFFS, IN GENERAL; SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS; SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS; THEIR PREPARATION OR TREATMENT, e.g. COOKING, MODIFICATION OFNUTRITIVE QUALITIES, PHYSICAL TREATMENT; THEIR TREATMENT, NOT COVERED BY OTHER CLASSES

The present invention relates to a composition for alleviating skin sensitivity, comprising a compound represented by chemical formula 1, a salt thereof, a stereoisomer thereof, a hydrate thereof, or a solvate thereof as an active ingredient. Specifically, the composition can alleviate the sensitivity of the skin irritated by ultraviolet rays, and more specifically, the composition for alleviating skin sensitivity can alleviate skin sensitivity by reducing inflammatory factors in skin cells irritated by simultaneous stimulation of UVA and UVB rays. 본 개시는 화학식 1로 표시되는 화합물, 그 염, 그 입체 이성질체, 그 수화물 또는 그 용매화물을 유효성분으로 포함하는 피부 민감성 완화용 조성물에 관한 것이다. 구체적으로, 상기 조성물로 자외선에 의해 자극된 피부의 민감성을 완화 할 수 있으며, 더욱 구체적으로는, 상기 피부 민감성 완화용 조성물로 UVA 및 UVB의 자외선의 동시 자극에 의해 자극된 피부의 세포에서 염증성 인자를 감소시킴으로써 피부 민감성을 완화시킬 수 있다.