PRESSURE VARIANCE TYPED OXYNITRIDE HEAT TREATMENT FURNACE AND METHOD OF TREATING OXYNITRDE USING THE SAME

• Main Author: CHOI, DONG CHEOL
• Format: Patent
• Language: English; Korean
• Published: 18.04.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a pressure change type oxy-nitriding heat treatment furnace. In addition, the present invention relates to an oxy-nitriding treatment method in which uniform oxy-nitriding is achieved through gas fluidity by using the pressure change type oxy-nitriding heat treatment furnace. The present invention is an invention for solving a problem of a preexisting oxy-nitriding method that there is a deviation by charging position and part of an object to be treated, and causes the gas fluidity in a chamber by using a decompression chamber and a pressing unit to ultimately achieve uniform oxy-nitriding treatment on a surface of the object to be treated. The oxy-nitriding heat treatment furnace comprises the chamber, a trade unit, a plurality of decompression pipe units, the decompression chamber, the pressing unit, and pressing pipe units. 본 발명은 압력 변화형 산질화 열처리로에 관한 것이다. 또한, 본 발명은 이러한 압력 변화형 산질화 열처리로를 이용하여 가스 유동성을 통해 균일한 산질화가 이루어지는 산질화 처리 방법에 관한 것이다. 본 발명은 기존 산질화 방법의 경우 피처리물이 장입되는 위치와 부위별로 편차가 존재한다는 문제점을 해결하기 위한 발명으로써 감압 챔버 및 가압부를 이용하여 챔버에서의 가스의 유동성을 일으켜 궁극적으로 피처리물 표면에서 균일한 산질화 처리를 달성할 수 있다.