ZIF-8 METHOD OF GOLD NANOROD TRANSFORMATION IN NANOSCALE CONFINEMENT OF ZIF-8

The present invention relates to a method of controlling the shape of gold nanorod particles in a nanometer local space of ZIF-8, capable of coating the surface of metal nanoparticles with ZIF-8 which is a metal organic frame body having a specific surface area, and enabling branched metal nanoparti...

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Bibliographic Details
Main Authors PARK SU HYEON, KIM JU YEONG, LEE JAE DEOK, BAE CHEONG WON
Format Patent
LanguageEnglish
Korean
Published 12.01.2022
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Summary:The present invention relates to a method of controlling the shape of gold nanorod particles in a nanometer local space of ZIF-8, capable of coating the surface of metal nanoparticles with ZIF-8 which is a metal organic frame body having a specific surface area, and enabling branched metal nanoparticles, which are grown in a limited space by transforming the shape of the metal nanoparticles through chemical etching and regrowth reaction, to have a high superficial, electric field amplification and a high light/head effect. In accordance with the present invention, the method of controlling the shape of gold nanorod particles in a nanometer local space of ZIF-8 includes: a first step of manufacturing a gold nanorod by using chloroauric acid (HAuCl4), sodium borohydride (NaBH4), silver nitrate (AgNO3) and ascorbic acid to hexadecyltrimethylammonium bromide (CTAB); a second step of coating the surface of the gold nanorod with zeolitic imidazolate framework-8 (ZIF-8) by making the manufactured gold nanorod react to 2-methylimidazole and a zinc nitrate solution; a third step of etching the coated gold nanorod into a gold nanoball; and a fourth step of reducing the gold nanoball for regrowth. 본 발명은 높은 비표면적을 가진 금속유기골격체인 ZIF-8을 금 나노입자 표면에 코팅하고, 화학적 에칭 및 재성장 반응을 통해 금 나노입자의 형태를 변형하여 제한된 공간에서 성장시킨 분지형 금 나노입자가 높은 표면적, 전기장 증폭 및 높은 광열 효과를 나타낼 수 있도록 마련하는 ZIF-8의 나노미터 국소 공간에서 금 나노막대 입자의 형태 제어 방법에 관한 것이다. 본 발명인 ZIF-8의 나노미터 국소 공간에서 금 나노막대 입자의 형태 제어 방법은, 헥사데킬트리메틸암모늄 브롬화물(hexadecyltrimethylammonium bromide, CTAB)에 염화금산(HAuCl4), 수소화붕소나트륨(NaBH4), 질산은(AgNO3) 및 아스코르브 산을 이용하여 금 나노막대를 제조하는 제1단계; 상기 제조된 금 나노막대를 2-메틸이미다졸(2-methylimidazole)과 질산 아연(zinc nitrate) 수용액과 반응하여 ZIF-8(zeolitic imidazolate framework-8)을 상기 금 나노막대 표면에 코팅하는 제2단계; 상기 코팅된 금 나노막대를 에칭(etching)하여 금 나노구형으로 생성하는 제3단계; 및 상기 금 나노구형을 환원하여 재성장 하는 제4단계;에 의해 수행되는 것을 특징으로 한다.
Bibliography:Application Number: KR20210018398