High pressure pumping apparatus and treatment system of liquefied gas having the same

The present invention relates to a high-pressure pumping device and a liquefied gas treatment system including the same. The high-pressure pumping device of the present invention is a high-pressure pumping device including a high-pressure pump for pressurizing liquefied gas. The high-pressure pump c...

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Bibliographic Details
Main Authors LEE TAE SEOK, HEO HEE SEUNG, KIM DAE SOO
Format Patent
LanguageEnglish
Korean
Published 28.04.2021
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Summary:The present invention relates to a high-pressure pumping device and a liquefied gas treatment system including the same. The high-pressure pumping device of the present invention is a high-pressure pumping device including a high-pressure pump for pressurizing liquefied gas. The high-pressure pump comprises: a cylinder through which the liquefied gas is sucked and discharged; a piston reciprocating inside the cylinder; and a piston rod for driving the piston. The cylinder is provided with two suction portions and two discharge portions, and the liquefied gas is sucked through any one of the two suction portions. When the liquefied gas is discharged through any one of the two discharge portions, the liquefied gas is not sucked through the other suction portion, and the liquefied gas is not discharged through the other discharge portion. 본 발명은 고압 펌핑장치 및 이를 포함하는 액화가스 처리 시스템에 관한 것으로서, 본 발명의 고압 펌핑장치는, 액화가스를 가압하기 위한 고압 펌프를 포함하는 고압 펌핑장치에서, 상기 고압 펌프는, 상기 액화가스가 흡입 및 토출되는 실린더; 상기 실린더 내부를 왕복 운동하는 피스톤; 및 상기 피스톤을 구동시키는 피스톤 로드를 포함하고, 상기 실린더에는, 2개의 흡입부와 2개의 토출부가 마련되며, 상기 2개의 흡입부 중 어느 하나의 흡입부를 통해 상기 액화가스가 흡입되고, 상기 2개의 토출부 중 어느 하나의 토출부를 통해 상기 액화가스가 토출될 때, 다른 하나의 흡입부를 통해 상기 액화가스가 흡입되지 않고, 다른 하나의 토출부를 통해 상기 액화가스가 토출되지 않는 것을 특징으로 한다.
Bibliography:Application Number: KR20200005634