Metal foil hole processing method using electrolytic processing

Provided is a method for processing a hole on a metal thin plate using an electrolytic processing, wherein a dimple is formed corresponding to a hole processing position on the surface of a metal thin plate, before a PDMS-masking is formed at the dimple. An exposed portion on the metal thin plate at...

Full description

Saved in:
Bibliographic Details
Main Authors CHOI SEUNG GEON, CUI XIONGJIE, PARK TAE WON, KIM SEONG HYUN, LEE EUN SANG, MOON GI CHANG, SONG WOO JAE
Format Patent
LanguageEnglish
Korean
Published 25.04.2019
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Provided is a method for processing a hole on a metal thin plate using an electrolytic processing, wherein a dimple is formed corresponding to a hole processing position on the surface of a metal thin plate, before a PDMS-masking is formed at the dimple. An exposed portion on the metal thin plate at which the PDMS-masking is not formed undergoes a passivation processing. After the PDMS-masking is removed from the dimple, a hole is formed at the dimple through an electrolytic processing. Therefore, an undercut phenomenon is significantly reduced, such that a hole size and the undercut of the entire processed area can be uniformly controlled. Moreover, a hole processing of the entire processed area is uniformly performed, thereby preventing processing precision from deteriorating. 본 발명은 금속 박판의 표면 중 홀 가공위치에 대응하여 딤플을 형성하고, 상기 딤플에 피디엠에스-마스킹(PDMS-Masking)을 형성한 후, 금속 박판 중 피디엠에스-마스킹이 형성되지 않은 노출된 부분은 부동태화 처리를 하며, 상기 딤플에서 피디엠에스-마스킹 제거 후, 전해가공으로 상기 딤플에 홀을 형성하면, 언더컷 현상이 현저하게 감소하여, 가공부위 전체의 홀 사이즈 및 언더컷을 균일하게 제어할 수 있고, 전체 가공영역의 홀가공을 균일하게 진행함으로써 가공 정밀도 저하를 막을 수 있는 전해가공을 이용한 금속 박판 홀 가공방법을 제공한다.
Bibliography:Application Number: KR20170143967