4 - GROUP 4 METAL ELEMENT-CONTAINING ALKOXY COMPOUND PREPARING METHOD THEREOF PRECURSOR COMPOSITION INCLUDING THE SAME FOR FILM DEPOSITION AND METHOD OF DEPOSITING FILM USING THE SAME

• Main Authors: HAN, WON SEOK, PARK, MYEONG HO, KOH, WON YONG
• Format: Patent
• Language: English; Korean
• Published: 23.10.2017
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

신규한 4 족 금속 원소-함유 알콕시 화합물, 상기 4 족 금속 원소-함유 알콕시 화합물의 제조 방법, 상기 4 족 금속 원소-함유 알콕시 화합물을 포함하는 막 증착용 전구체 조성물, 및 상기 전구체 조성물을 이용하는 4 족 금속 원소-함유 막의 증착 방법을 제공한다. Provided are: a novel group 4 metal element-containing alkoxy compound; a method for preparing the group 4 metal element-containing alkoxy compound; a film deposition precursor composition containing the group 4 metal element-containing alkoxy compound; and a method for depositing a group 4 metal element-containing film by using the precursor composition.