APPARATUS FOR DEPOSITING THIN-FILM
The present invention relates to an apparatus for depositing a thin film. Productivity can be improved by reducing a failure rate of a substrate by including a mask, a first plate, and a second plate. The quality of the substrate can be improved by easily controlling parallelism of a configuration t...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
07.02.2017
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to an apparatus for depositing a thin film. Productivity can be improved by reducing a failure rate of a substrate by including a mask, a first plate, and a second plate. The quality of the substrate can be improved by easily controlling parallelism of a configuration to pressurize the substrate in a deposition process. Also, production processes are simplified and production costs are saved by obtaining high position reproducibility in the configuration to pressurize the substrate in the deposition process.
본 발명은 박막 증착장치에 관한 것으로, 마스크; 제1 플레이트; 및 제2 플레이트; 를 포함하여, 기판의 불량률을 감소시켜 생산성을 향상시킬 수 있고, 증착 공정시 기판을 가압하는 구성의 평행도를 쉽게 조절하여 기판의 품질 향상을 기대할 수 있을 뿐만 아니라 증착 공정시 기판을 가압하는 구성이 높은 위치 재현성을 갖게 되어 생산 공정을 단순화하고 생산비용을 절감할 수 있는 것을 특징으로 한다. |
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Bibliography: | Application Number: KR20150170844 |