DIAMOND ELECTRODE AND METHOD OF MANUFACTURING THE SAME

• Main Authors: HAN, CHI BOK, LEE, YOU KEE, CHOI, YONG SUN
• Format: Patent
• Language: English; Korean
• Published: 07.01.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

The present invention relates to an industrial diamond electrode manufactured by a chemical vapor deposition method and a manufacturing method thereof. When a conductive diamond thin film is formed on a conductive substrate or a carbon material by a heat filament chemical vapor deposition (HFCVD) method, a method of manufacturing the diamond electrode includes: feeding a carbon-based supply gas just before carrying out a process condition to grow the diamond thin film, thereby forming NbC on the surface of a niobium substrate; and depositing the conductive diamond thin film two times or more. A pin hole accompanied when the conductive diamond thin film is formed is buried to suppress the substrate from coming into contact with an electrolyte under an electrolysis atmosphere, thus allowing corrosion of the substrate from being slow thereby extending the lifespan of the diamond electrode.