METHOD FOR FORMING THE PATTERN IN THE SEMICONDUCTOR DEVICE

• Main Author: BOK, CHEOL KYU
• Format: Patent
• Language: English; Korean
• Published: 20.12.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A method for forming a pattern of a semiconductor device is provided to form a micro contact hole pattern using a negative development process, thereby increasing resolution. CONSTITUTION: A hard mask layer is formed on a layer(100) to be etched. A first photosensitive film is coated on the...