APPARATUS FOR PROCESSING A SUBSTRATE

• Main Authors: SEO, JONG SEOK, OH, CHANG SUK
• Format: Patent
• Language: English
• Published: 10.12.2008
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The substrate processing apparatus is provided to provide the robot which includes the guide rail, the heating plate, the cooling plate and the robot arm. The substrate processing apparatus(10) comprises the first processing block(100), the second processing block(200), and the main feed block(300). The first processing block performs the coating process and photolithography process. The second processing block is arranged to face the first processing block. The second processing block heat-treats the substrates. The main feed block transfers the substrates while being arranged between the first processing block and the second processing block. The second processing block comprises the first, the second and third gear blocks(210, 230, 250). The first and the second unit block are laminated to the double layer. The first and the second unit block comprise a plurality of heating units for heating up the substrates. The third gear block is arranged in one side of the second unit block. The third gear block comprises a plurality of heat treatment units for heat-treating the substrates.