INTERNAL MEMBER OF PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING THE SAME

• Main Authors: KIM, SAM WOONG, CHOI, SI NAM, RYU, CHUNG RYOUL, YE, KYUNG HWAN, JANG, KYUNG IC
• Format: Patent
• Language: English
• Published: 05.12.2008
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES

An internal member of a plasma processing apparatus and a manufacturing method thereof are provided to reduce an erroneous operation due to transformation of an opening part by minimizing the transformation of the opening part formed in the internal member. The predetermined roughness is formed by surface-processing one surface of a base material(S100). A plurality of opening parts are formed on the base material(S110). A thermal spray coating layer is formed on one surface of the base material(S130). The predetermined roughness is 2 to 7 um in reference to the average roughness of a central line. The transformation of the opening part is suppressed by forming the opening part after the roughness is formed. The opening part has a circular shape. The roundness of the opening part is below 0.02 mm after forming the thermal spray coating layer when the opening part has the circular shape.