ELECTRON BEAM TESTING SYSTEM AND TESTING METHOD

• Main Authors: CHOI, EUN YOUL, PARK, WOO JONG
• Format: Patent
• Language: English
• Published: 09.09.2008
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

An EBT(Electron Beam Testing) system and a test method are provided to monitor a defect of a substrate quickly and efficiently during a test process, thereby quickly testing a larger substrate. A test chamber(200) has a substrate stage including first and second stages. The first stage can move first dimensionally. The second stage can move second dimensionally. At least one or more electron beam columns(250) are disposed on the test chamber. A load lock chamber(100) is disposed to be contacted with the test chamber, and has an end effecter. The end effecter linearly moves so as to transfer a substrate for test onto the substrate stage of the test chamber. At least one or more support trays are installed within the load lock chamber. In the support tray, the end effecter is installed so as to mount the substrate. An end effecter lift is installed on the support tray so as to ascend and descend the end effecter.