CENTER PIN OF A WAFER STAGE OF AN EXPOSURE APPARATUS

A wafer stage center pin for an exposure apparatus is provided to eliminate a limitation for an amount of rotation compensation of a wafer by rotating the wafer at a wanted angle, thereby shortening a time required for an exposure process. A body(110) is movably installed on a wafer stage(200) to su...

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Bibliographic Details
Main Author CHA, SUNG WHAN
Format Patent
LanguageEnglish
Published 26.01.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A wafer stage center pin for an exposure apparatus is provided to eliminate a limitation for an amount of rotation compensation of a wafer by rotating the wafer at a wanted angle, thereby shortening a time required for an exposure process. A body(110) is movably installed on a wafer stage(200) to support a center of a wafer at an upper end thereof. A lifting member(120) is provided on one side of the body to lift the body. A motor(130) has a rotation shaft connected to a lower portion of the body to rotate the body corresponding to a rotation angle of the rotation angle, thereby compensating a rotating amount of the wafer. The body has a vacuum hole for chucking the wafer at an upper end thereof.
Bibliography:Application Number: KR20050130933