WATER TREATMENT AGENT FOR PREVENTING SCALE DEPOSITION IN PIPES AND CORROSION OF PIPES, AND WATER TREATMENT METHOD USING THE SAME

PURPOSE: A water treatment agent for preventing scale deposition in pipes and corrosion of pipes, and water treatment method using the same are provided. CONSTITUTION: The water treatment method using the corrosion inhibiting agent is characterized in that (a) the concentration of zinc ion in circul...

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Main Authors YOO, GWANG HUI, HA, JAE MIN, PARK, JUN WON, SHIN, JEONG JU, HAN, SUN JONG, CHOI, DONG JIN
Format Patent
LanguageEnglish
Korean
Published 09.11.2001
Edition7
Subjects
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Summary:PURPOSE: A water treatment agent for preventing scale deposition in pipes and corrosion of pipes, and water treatment method using the same are provided. CONSTITUTION: The water treatment method using the corrosion inhibiting agent is characterized in that (a) the concentration of zinc ion in circulation cooling system is maintained within 0.05 to 5.0 ppm, wherein zinc salt is selected from the group consisting of zinc chloride, zinc sulfate and zinc nitride; (b) the concentration of orthophosphate in circulation cooling system is maintained within 0.5 to 30 ppm, wherein orthophosphate is selected from the group consisting of monosodium phosphate, disodium phosphate, trisodium phosphate and phosphoric acid; (c) the concentration of organic phosphate in circulation cooling system is maintained within 0.5 to 30 ppm, wherein organic phosphate is selected from the group consisting of hydroxyethylidene diphosphonic acid, hydroxy phosphonocarboxylic acid, amino trimethylene phosphonic acid and phosphonobutane tricarboxylic acid; (d) the concentration of azole compounds in circulation cooling system is maintained within 0.1 to 20 ppm, wherein azole compound is selected from the group consisting of tolyltriazole, benzotriazole and mercaptobenzothiazole; and (e) the concentration of acrylate copolymer represented by formula I in circulation cooling system is maintained within 0.1 to 100 ppm, wherein n and m is an integer of 5 to 1,000, respectively; R1 and R6 is hydrogen atom, alkyl or hydroxyl radical, respectively; R2 and R3 is hydrogen atom or C1-C2 alkyl, respectively; R4 is hydrogen atom or alkyl; and R5 is C1-C10 alkyl or C8-C10 aralkyl; X and Y represents hydrogen atom, monovalent metal ion or N(R7)2 (wherein R7 represents hydrogen atom, C1-C5 alkyl or C1-C5 hydroxy alkyl).
Bibliography:Application Number: KR19970041933