CLEANING APPARATUS AND METHOD FOR SEMICONDUCTOR PROCESS

• Main Authors: DOI, NOBUAKI, TANAKA, HIROSI, KANNO, ITARU, OMORI, TOSIAKI
• Format: Patent
• Language: English; Korean
• Published: 15.10.1999
• Edition: 6
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; FIRE-FIGHTING; GRINDING; HUMAN NECESSITIES; LIFE-SAVING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; POLISHING; PREVENTION OF FOULING IN GENERAL; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

[목적] 본 발명은, 기판상의 오염물을 효과 있게 제거할 수 있도록 개량된 장치를 제공하는 것이다. [구성] 해당 장치는, 액체의 방울(21)을 기판(1)에 향해서 분출하는 분출노즐(11)을 구비한다. 분출노즐(11)에는, 액체공급수단(23) 및 가스 공급수단(22)가 접속된다. 분출노즐(11)내에는, 분출노즐(11)에 공급된 액체와 기체와를 혼합하며, 액체를 액체의 방울(21)로 바꾸는 혼합수단이 설치되어 있다. The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.