SPUTTERING APPARATUS OF MAGNETRON
없음. A magentron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by where xi (u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operatio...
Saved in:
| Main Authors | , |
|---|---|
| Format | Patent |
| Language | English Korean |
| Published |
15.01.1999
|
| Edition | 6 |
| Subjects | |
| Online Access | Get full text |
Cover
Loading…
| Abstract | 없음.
A magentron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by where xi (u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant. |
|---|---|
| AbstractList | 없음.
A magentron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by where xi (u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant. |
| Author | ANDERSON, ROBERT L HELMER, JOHN C |
| Author_xml | – fullname: HELMER, JOHN C – fullname: ANDERSON, ROBERT L |
| BookMark | eNrjYmDJy89L5WRQDA4IDQlxDfL0c1dwDAhwDHIMCQ1W8HdT8HV093MNCfL342FgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8d5BBoZmFhYmBk5OhsbEqAEAFzgkYg |
| ContentType | Patent |
| DBID | EVB |
| DatabaseName | esp@cenet |
| DatabaseTitleList | |
| Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Medicine Chemistry Sciences |
| DocumentTitleAlternate | 마그네트론 스퍼터링 장치 |
| Edition | 6 |
| ExternalDocumentID | KR0168840BB1 |
| GroupedDBID | EVB |
| ID | FETCH-epo_espacenet_KR0168840BB13 |
| IEDL.DBID | EVB |
| IngestDate | Fri Jul 19 13:11:08 EDT 2024 |
| IsOpenAccess | true |
| IsPeerReviewed | false |
| IsScholarly | false |
| Language | English Korean |
| LinkModel | DirectLink |
| MergedId | FETCHMERGED-epo_espacenet_KR0168840BB13 |
| Notes | Application Number: KR19900007247 |
| OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990115&DB=EPODOC&CC=KR&NR=0168840B1 |
| ParticipantIDs | epo_espacenet_KR0168840BB1 |
| PublicationCentury | 1900 |
| PublicationDate | 19990115 |
| PublicationDateYYYYMMDD | 1999-01-15 |
| PublicationDate_xml | – month: 01 year: 1999 text: 19990115 day: 15 |
| PublicationDecade | 1990 |
| PublicationYear | 1999 |
| RelatedCompanies | VARIAN ASSOCIATES INC |
| RelatedCompanies_xml | – name: VARIAN ASSOCIATES INC |
| Score | 2.4776576 |
| Snippet | 없음.
A magentron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by where xi (u) is... |
| SourceID | epo |
| SourceType | Open Access Repository |
| SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| Title | SPUTTERING APPARATUS OF MAGNETRON |
| URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990115&DB=EPODOC&locale=&CC=KR&NR=0168840B1 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KFfWmVdH6IAXJLZjQbJM9BMnTYsmDdCO9lTy6UARbbMS_72RN1Ivehl2YfcDszOzO9y3AHS0p13NRVk6pousFUShXqcKLEoPvCeeENy-6YTSZZvrTgix6sO6wMIIn9EOQI6JFlWjvtTivtz-XWJ6ordzdF2ts2jwEzPLkqoWLNUBKInuO5SexF7uy61qzVI5SCyMbE3MZBxOlPYyijab6y392GlDK9rdHCY5hP0Flr_UJ9F42Azh0u4_XBnAQtu_dKLamtzuF0TzJGBMMUJKdJHZqs2wuxYEU2o-Rz9I4OoNR4DN3quBYy-91LWdpNytHG59DH_P91QVIhZEbRKtMveFGVwkKam5wk3JKqzEa3CUM_9Yz_K_zCo6-WAc0RSPX0K_f3lc36FPr4lbsxic5bHbX |
| link.rule.ids | 230,309,783,888,25578,76884 |
| linkProvider | European Patent Office |
| linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KFetNq2LrKwXJLdjQbNM9BMnTapsH6UZ6K03bhSLYYiP-fWfXRL3obdiF2QfMzszufN8C3NIF5cZclpVTqhlGTjTKu1Tj-QKD7z7nhIsX3TDqDzPjaUqmNVhXWBjJE_ohyRHRohZo74U8r7c_l1ierK3c3eVrbNrcB8zy1GUJFxNASqJ6juUnsRe7qutao1SNUgsjmwHmMg4mSnumEEXk9OwIUMr2t0cJjmA_QWWvxTHUXjZNaLjVx2tNOAjL924US9PbnUBnkmSMSQYoxU4SO7VZNlHiQAnth8hnaRydQifwmTvUcKzZ97pmo7SalaP3zqCO-f7qHJTcnJtEXw4MwY3eJSh05yYfUE7psocG14L233ra_3XeQGPIwvFs_BiNLuDwi4FA13RyCfXi7X11hf61yK_lznwC8pF5xw |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SPUTTERING+APPARATUS+OF+MAGNETRON&rft.inventor=HELMER%2C+JOHN+C&rft.inventor=ANDERSON%2C+ROBERT+L&rft.date=1999-01-15&rft.externalDBID=B1&rft.externalDocID=KR0168840BB1 |