DEPOSITION PROCESS AND APPARATUS FOR LOW DIELECTRIC SIOXFY FILM FORMATION AFTER GETTING RID OF NATIVE OXIDE BY ECR CVD

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Bibliographic Details
Main Authors BAEK, JONG-TAE, KANG, SEUNG-YEUL, YU, BYUNG-KON, KANG, WON-IK
Format Patent
LanguageEnglish
Published 01.12.1998
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Bibliography:Application Number: KR19950038771