PROJECTION TYPE EXPOSURE DEVICE

PURPOSE:To cut down the exposure time for accelerating the processing speed by a method wherein pulse laser beams in high output are used for a projection lens projecting a circuit pattern by using said pulse laser beams on a substrate. CONSTITUTION:Exposing laser beams 18 from a laser oscillator 17...

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Bibliographic Details
Main Authors MIYAUCHI TAKEOKI, MIZUKOSHI KATSURO
Format Patent
LanguageEnglish
Published 23.03.1989
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To cut down the exposure time for accelerating the processing speed by a method wherein pulse laser beams in high output are used for a projection lens projecting a circuit pattern by using said pulse laser beams on a substrate. CONSTITUTION:Exposing laser beams 18 from a laser oscillator 17 emitting pulse beams in sufficiently narrow width are refracted downward entering into an optical integrator 21 through a shutter 20 to become diffused light 22 in even light distribution. Next, the diffused light 22 is entered into a collimator lens 23 to be parallel light fluxes and further fed to a reticle holder 2. Reticle images are transferred to an exposed plate 5 by outputting pulse laser beams at specified position. In such a constitution, the reticle images can be exposed continuously while moving at the speed not exceeding 100mm/s by using laser beams in output exceeding 30mJ subjected to the feed of photorepeater in pulse width not exceeding 1mus and exposure wave length of 3000-4000Angstrom .
Bibliography:Application Number: JP19880188433