SEMICONDUCTOR EXPOSURE DEVICE

PURPOSE:To produce a test wafer for measuring distortion in a projection optical system, by changing the printing range and the wafer shifting mode for a single pattern according to stored information of a group of parameters. CONSTITUTION:A semiconductor exposure unit according to the present inven...

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Bibliographic Details
Main Authors HAMAZAKI FUMIYOSHI, YOSHIDA MAKOTO
Format Patent
LanguageEnglish
Published 30.03.1988
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To produce a test wafer for measuring distortion in a projection optical system, by changing the printing range and the wafer shifting mode for a single pattern according to stored information of a group of parameters. CONSTITUTION:A semiconductor exposure unit according to the present invention comprises an illumination device 1, a masking blade 2 for controlling the amplitude of an illuminated range, a reticle stage 3 for carrying a reticle 4 having a circuit pattern 5, an imaging lens 6 serving as a projection optical system for printing the pattern, an X-Y stage 7 for carrying a wafer 8 on which the circuit pattern is to be printed and for shifting the wafer along the X-and Y-directions in the printing plane, a pulse motor 9 for driving the masking blade, a pulse motor 10 for driving the X-Y stage, a control box 11 in which a control unit such as CPU and a storage device are received and a console consisting of a monitor display 12 and a keyboard 13. Such exposure unit can change the mode of moving the wafer as well as the range of exposure in a single wafer manufacturing process. Thus, it is possible to produce a test wafer for measuring distortion in the projection optical system of the subject device.
Bibliography:Application Number: JP19860212748