PROCESSOR
PURPOSE:To prevent moisture from getting mixed in processing vapor and a vapor generator by providing cooling means for circulating heated vapor from the vapor generator, and gas supply means for supplying dry gas to a space above the cooling means. CONSTITUTION:Heated vapor generated by heating iso...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
04.07.1988
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To prevent moisture from getting mixed in processing vapor and a vapor generator by providing cooling means for circulating heated vapor from the vapor generator, and gas supply means for supplying dry gas to a space above the cooling means. CONSTITUTION:Heated vapor generated by heating isopropylalcohol of a vapor generator 2 by a heater 3 is condensed by a cooling zigzag tube 9, dropped and circulated. When dry carbonate gas is continuously supplied from a feed tube 14 into a body 1, carbonate gas range is formed in the upper space of vapor surface 15 near the tube 9. When the circulation becomes a normal state, a semiconductor wafer 16 is conveyed to a predetermined position, and dried. After the drying is completed, the wafer 16 is placed at the intermediate position of the cooling tubes 9, 10, and removed after a predetermined time is elapsed. Accordingly, outer air is not contacted with the tube 9 to prevent moisture from getting mixed in vapor and the generator 2, thereby enhancing the reliability of the process. |
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Bibliography: | Application Number: JP19860306466 |