POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

• Main Authors: KOIBUCHI SHIGERU, ISOBE ASAO
• Format: Patent
• Language: English
• Published: 19.05.1988
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; AUXILIARY PROCESSES IN PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHYSICS

PURPOSE:To increase a residual film rate after development and to improve sensitivity as well by specifying 3mol reaction rate of a photosensitive agent prepd. by using methyl gallate to >=0.4. CONSTITUTION:The methyl gallate expressed by the formula I and 1,2- naphthoquinone-(2)-diazide-4-sulfonyl chloride, 1,2-naphthoquinone-(2)-diazide-5- sulfonyl chloride or the mixture composed thereof are dissolved in a solvent such as tetrahydrofuran and are synthesized by using a basic catalyst in order to improve reaction acceleration in such a manner that the 3mol reaction rate (weight ratio of the reactant added with the compd. to 3 hydroxyl groups of the methyl gallate) attains >=0.4. The weight ratio A/B, where the 3mol reaction rate is designated as x, the photosensitive agent as A and a high polymer soluble in an aq. alkali soln. as B, is so determined as to satisfy the formula II in order to obtain the high sensitivity and the high residual film rate.