DEVELOPING METHOD

• Main Authors: KISHIMURA SHINJI, NAKAJIMA MASAYUKI
• Format: Patent
• Language: English
• Published: 09.05.1988
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To control the developing time thereby to obtain a resist pattern having high resolution and good reproducibility of size control by monitoring the hydrogen ion concentration of developer during developing. CONSTITUTION:A hydrogen ion concentration measuring sensor 1 is inserted into developer 2 on a photoresist film 3. Development proceeds during steady state, and the state that hydroxide ion concentration is reduced is monitored by a pH meter. When it arrives at hydroxide ion concentration at optimal development time determined in advance, a rotary plate 5 is rotated manually or by an automatic controller, rinse solution is discharged by a rinse solution discharging nozzle 7, the developer 2 on the film 3 is removed for its development and the development is finished. Further, after a semiconductor wafer is washed, it is dried by a high speed rotation. As a result, a desired resist pattern with good reproducibility can be obtained.