ION SCATTERING SPECTROSCOPIC MICROSCOPE

PURPOSE:To make it possible to analyze a local distribution of composition in the outermost layer of a material surface by deflecting focused ion beams and two-dimensionally scanning them on the material surface and measuring an energy distribution of ions scattered with a specific scattering angle....

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Bibliographic Details
Main Authors KATAYAMA MITSUHIRO, AONO MASAKAZU
Format Patent
LanguageEnglish
Published 07.05.1988
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Summary:PURPOSE:To make it possible to analyze a local distribution of composition in the outermost layer of a material surface by deflecting focused ion beams and two-dimensionally scanning them on the material surface and measuring an energy distribution of ions scattered with a specific scattering angle. CONSTITUTION:Ion beams IB from an ion gun I are pulsed, and a starting signal from a trigger circuit TC is inputted to a time-crest transducer 8. Pulses of incident ions are focused by a lens EL and deflected in the X and Y directions by deflectors DX and DY and scanned on a surface of a material S. Scattered ions which are scattered by surface atoms of the material at a scattering angle of nearly 180 deg. are detected at a detector part D and inputted as stop signals to the transducer 8. Next, flight time of the scattered ions is measured by a computer 10, and flight time spectra of the scattered ions as well as scanning position of incident ions are recorded, so that a constituent distribution on the surface of the sample S can be analized.
Bibliography:Application Number: JP19860246777