PRODUCTION OF MAGNETIC RECORDING MEDIUM
PURPOSE:To form a vertical magnetic film having high performance by depositing a sputtered ferromagnetic metal on the 1st thin film while maintaining a non-magnetic substrate at a relatively low temp. and epitaxially growing and forming the 2nd thin film thereon. CONSTITUTION:The thin film which has...
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Format | Patent |
Language | English |
Published |
27.03.1987
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Abstract | PURPOSE:To form a vertical magnetic film having high performance by depositing a sputtered ferromagnetic metal on the 1st thin film while maintaining a non-magnetic substrate at a relatively low temp. and epitaxially growing and forming the 2nd thin film thereon. CONSTITUTION:The thin film which has high coercive force and permits the epitaxial crystal growth of the sputtering particles to be deposited at a low temp. on the 1st thin film is formed on said thin film by executing sputtering at the substrate temp. T1 or above in the stage of forming the 1st thin film on the film substrate 1 consisting of PET, etc. having low heat resistance. The ferromagnetic metal is thereafter sputtered on the 1st thin film at the substrate temp. T2 having the relation substrate temp. T2<T1 (T2 is considerably lower than the m.p. of the substrate) and is subjected to the epitaxial crystal growth to form the 2nd thin film. The thermal damage of the substrate is thereby eliminated and the vertically magnetized film having the high performance is formed. |
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AbstractList | PURPOSE:To form a vertical magnetic film having high performance by depositing a sputtered ferromagnetic metal on the 1st thin film while maintaining a non-magnetic substrate at a relatively low temp. and epitaxially growing and forming the 2nd thin film thereon. CONSTITUTION:The thin film which has high coercive force and permits the epitaxial crystal growth of the sputtering particles to be deposited at a low temp. on the 1st thin film is formed on said thin film by executing sputtering at the substrate temp. T1 or above in the stage of forming the 1st thin film on the film substrate 1 consisting of PET, etc. having low heat resistance. The ferromagnetic metal is thereafter sputtered on the 1st thin film at the substrate temp. T2 having the relation substrate temp. T2<T1 (T2 is considerably lower than the m.p. of the substrate) and is subjected to the epitaxial crystal growth to form the 2nd thin film. The thermal damage of the substrate is thereby eliminated and the vertically magnetized film having the high performance is formed. |
Author | KUME MINORU KISHIMOTO DAISUKE NAKATSUKA TAKAO |
Author_xml | – fullname: KISHIMOTO DAISUKE – fullname: KUME MINORU – fullname: NAKATSUKA TAKAO |
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Notes | Application Number: JP19850209378 |
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PublicationYear | 1987 |
RelatedCompanies | SANYO ELECTRIC CO LTD |
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Snippet | PURPOSE:To form a vertical magnetic film having high performance by depositing a sputtered ferromagnetic metal on the 1st thin film while maintaining a... |
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SubjectTerms | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | PRODUCTION OF MAGNETIC RECORDING MEDIUM |
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