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Summary:PURPOSE:To form a vertical magnetic film having high performance by depositing a sputtered ferromagnetic metal on the 1st thin film while maintaining a non-magnetic substrate at a relatively low temp. and epitaxially growing and forming the 2nd thin film thereon. CONSTITUTION:The thin film which has high coercive force and permits the epitaxial crystal growth of the sputtering particles to be deposited at a low temp. on the 1st thin film is formed on said thin film by executing sputtering at the substrate temp. T1 or above in the stage of forming the 1st thin film on the film substrate 1 consisting of PET, etc. having low heat resistance. The ferromagnetic metal is thereafter sputtered on the 1st thin film at the substrate temp. T2 having the relation substrate temp. T2<T1 (T2 is considerably lower than the m.p. of the substrate) and is subjected to the epitaxial crystal growth to form the 2nd thin film. The thermal damage of the substrate is thereby eliminated and the vertically magnetized film having the high performance is formed.
Bibliography:Application Number: JP19850209378