PLASMA PROCESSING CONDITION DIAGNOSING APPARATUS

• Main Authors: YABUMOTO CHIKAKUNI, MURAMATSU YASUSHI
• Format: Patent
• Language: English
• Published: 02.11.1987
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

PURPOSE:To improve the sensitivity of a plasma processing state diagnosing apparatus by composing to reciprocate an infrared light in a plasma processing chamber. CONSTITUTION:An infrared light L1 from a wavelength variable infrared light generator 1 is incident into a plasma processing chamber 10, reciprocated by optical systems 35, 36 in the chamber 10, and emitted as an infrared light L2 out of the chamber 10. Plasma processing condition information generating means 40 generates information representing plasma processing condition in the chamber 10 by the light L2 and part of the light L1 incident into the chamber 10. Since the infrared light is frequently absorbed by chemical seed in the plasma, information representing plasma processing condition regarding chemical seed of certain type can be also obtained, and the plasma processing condition regarding such a chemical seed can be readily diagnosed.