METHOD FOR CORRECTING WHITE SPOT DEFECTS OF PHOTOMASK WITH ION BEAMS

PURPOSE:To enhance scattering degree and to enable high light shading performance to be obtained by forming working single or plural grooves or pits irregular in form, depth, and arrangement in each defect. CONSTITUTION:The defect of white spots present between patterns 31 formed wit a film made of...

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Bibliographic Details
Main Authors HARAICHI SATOSHI, MIYAUCHI TAKEOKI, SHIMASE AKIRA, YAMAGUCHI HIROSHI
Format Patent
LanguageEnglish
Published 17.10.1987
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To enhance scattering degree and to enable high light shading performance to be obtained by forming working single or plural grooves or pits irregular in form, depth, and arrangement in each defect. CONSTITUTION:The defect of white spots present between patterns 31 formed wit a film made of Cr, chromium oxide, or the like is irradiated with in beams to roughen the glass substrate 30 of a photomask or to form depressions on it, thus permitting the white spot defects of the photomask to be corrected and sufficient light shading performance and precision of pattern correction to be obtained.
Bibliography:Application Number: JP19860079910