MASK SUBSTRATE FIXING MECHANISM

• Main Authors: IIZUKA NOBUYUKI, FUKUSHIMA TSUNEMI, HONGO TSUTOMU
• Format: Patent
• Language: English
• Published: 18.06.1987
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To eliminate a danger of absorbing dusts in an air type mask substrate fixing mechanism and to obviate the replacement of an adapter when thicknesses of samples are different from each other by composing of a sample bearer moving element for moving along a first guide secured to a sample bearer, and an adapter moving element for pressing a mask substrate toward a positioning piece and having a fixing work pressing piece. CONSTITUTION:Since a cam 20 is pressed together with a sample bearer moving element 21 by a roller 17 to move in a direction of an arrow A when a sample bearer 2 rises by a Z-axis moving mechanism, a push rod 24 contacts an adapter moving element 2 to push it, and a work pressing piece 29 pushes forward a work 4. Since a positioning piece 30 is fixed to opposed one corner of an adapter 3, the work 4 stops, i.e., is positioned. In this case, to suitably alleviate a force applied to the work 4, a third spring 25 provided at a push rod 24 acts effectively. When the inspection of the work is finished, the bearer 2 moves down by a control mechanism, and a sample bearer 21 and the moving element 26 are respectively returned to the original positions by a first spring 23 and a second spring 28.