APPARATUS FOR FORMING THIN FILM

• Main Authors: MIYAUCHI TAKEOKI, AZUMA JUNZO, HONGO MIKIO, FUKUZAWA KUNIYUKI, MIZUKOSHI KATSURO
• Format: Patent
• Language: English
• Published: 09.06.1987
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE:To prevent touch of both the window for transmitting laser light and reaction gas and to prevent a thin film from being stuck on the window by comparting a reaction chamber in an apparatus for forming the thin film due to laser light into 2-3 pieces and fitting the window to the comparted ch...