LIGHT INDUCED REACTIVE ION PLATING METHOD

PURPOSE:To accelerate a reaction on the surface of a substrate when the substrate is coated with a compound by ion plating, by carrying out the reaction in an atmosphere contg. radicals produced from a reactive gaseous atmosphere by a photochemical reaction. CONSTITUTION:Gaseous O2 is introduced int...

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Bibliographic Details
Main Author IHARA HIROHIKO
Format Patent
LanguageEnglish
Published 16.04.1986
Edition4
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:PURPOSE:To accelerate a reaction on the surface of a substrate when the substrate is coated with a compound by ion plating, by carrying out the reaction in an atmosphere contg. radicals produced from a reactive gaseous atmosphere by a photochemical reaction. CONSTITUTION:Gaseous O2 is introduced into a vacuum vessel 1 from the gas introducing inlet 4, and ultraviolet rays are irradiated on the gaseous O2 from a deuterium lamp 5 to convert the gaseous O2 into radical gaseous O2. An electron beam is irradiated on Al2O3 in a crucible 6 from an electron gun 7 to produce a dissociated intermediate product of Al2O3, and this product is grown on the surface of a substrate 3 as Al2O3 with the radical gaseous O2.
Bibliography:Application Number: JP19840192579