ORIENTATION DEVICE OF WAFER

• Main Author: NINOMIYA MASAHARU
• Format: Patent
• Language: English
• Published: 03.03.1986
• Subjects: BASIC ELECTRIC ELEMENTS; CONTROLLING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

PURPOSE:To perform orientation of any wafers with different diameters without adjustment and contact with periphery thereof by a method wherein peripheral plane of wafer is irradiated with the light flux from a projector to change the light quantity entering into a light receiver by means of changing the reflecting directions corresponding to the angle of optical axis meeting the peripheral plane of wafer. CONSTITUTION:A projector 8 projects light flux into an almost central point on almost level surface of a wafer 2. Then the light flux hitting the peripheral plane 15 through a halfmirror 9 is reflected by the plane 15 back to the mirror 9 by which the light flux is further reflected in a light receiver 10. At this time, a motor 16 is driven to make a controller 17 process a received light quantity related to the rotating angle for detecting the relation between the direction of orientation flat and the rotating angle of motor 16 to be stopped at any specified rotating angle. Now assuming the applicable light flux to be parallel beams, any wafer with different nominal dimention of diameter may be assured of equivalent light quantity received without any adjustment or alteration of mechanism at all. Besides, the orientation flat for peripheral plane 15 may be detected with no contact therewith by means of utilizing the light flux.