LIQUID METAL ION SOURCE

PURPOSE:To stabilize an emitted ion beam and reduce the power consumption by providing a liquid metal ion source having an emitter of a sharp-pointed tip with a heater which heats entire ionized material and a heater which heats the tip of the emitter. CONSTITUTION:A sump for an ionized material 2 s...

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Bibliographic Details
Main Authors HARAICHI SATOSHI, MIYAUCHI TAKEOKI, SHIMASE AKIRA, YAMAGUCHI HIROSHI
Format Patent
LanguageEnglish
Published 14.10.1986
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:PURPOSE:To stabilize an emitted ion beam and reduce the power consumption by providing a liquid metal ion source having an emitter of a sharp-pointed tip with a heater which heats entire ionized material and a heater which heats the tip of the emitter. CONSTITUTION:A sump for an ionized material 2 such as Ga is provided with a heater 3 required for maintaining the ionized material 2 in molten state. An emitter 4 of a sharp-pointed tip penetrating through the sump for the material 2 is provided with a surrounding capillary 1 to heat the tip of the emitter 4 locally to a high temperature with a heater 7. A high voltage is applied across the emitter 4 and a draw-electrode 6 to take out a stable ion beam 5 efficiently. Thus power consumption is reduced because not the entire ionized material 2 is heated to a high temperature, and the ion beam 5 is also stably taken out.
Bibliography:Application Number: JP19850070886