ALIGNING SYSTEM

PURPOSE:To obtain a more precise means of measuring the amount of mis- alignment of a mask and a wafer by a method wherein a mark interval measurement error caused by a magnification error of an optical system for observing an identification mark is corrected by varying a frequency of a measuring cl...

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Bibliographic Details
Main Authors AYADA NAOKI, KUROKI YOUICHI, HAMAZAKI FUMIYOSHI, MATSUMURA TAKASHI
Format Patent
LanguageEnglish
Published 25.11.1985
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To obtain a more precise means of measuring the amount of mis- alignment of a mask and a wafer by a method wherein a mark interval measurement error caused by a magnification error of an optical system for observing an identification mark is corrected by varying a frequency of a measuring clock. CONSTITUTION:A clock pulse from a clock generator 7 is once frequency-divided by a preset counter 9 and then inputted to a counter 3 for measuring the amount of mis-alignment, i.e. a pulse interval. The preset counter 9 delivers a carry in every one rotation of the counter, and this carry turns to be a clock of a counter 4 for measuring the amount of mis-alignment. Some value is set in a latch 8 beforehand by CPU6, and this value is re-preset in the preset counter 9 automatically in every rotation of the preset counter 9.
Bibliography:Application Number: JP19840091736