PRODUCTION OF SILICON TETRACHLORIDE

PURPOSE:To produce SiCl4 free from the unreacted chlorine gas, preventing the production of phosgene, by reacting an SiO2-containing substance and a carbon- containing substance with a chlorine-containing gas, and controlling the chlorine feed rate so as to get a specific CO2 content. CONSTITUTION:S...

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Bibliographic Details
Main Authors SUZUKI MASAHARU, HOSONO KOUJI, NAKAJIMA MASAHIKO, MIYAI AKIRA
Format Patent
LanguageEnglish
Published 26.06.1985
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Summary:PURPOSE:To produce SiCl4 free from the unreacted chlorine gas, preventing the production of phosgene, by reacting an SiO2-containing substance and a carbon- containing substance with a chlorine-containing gas, and controlling the chlorine feed rate so as to get a specific CO2 content. CONSTITUTION:SiO2 is mixed with C at a specific molar ratio, and the mixture is granulated. The pellet is filled through the pellet reservoir 1 into the vertical reactor 2, and heated with the electric furnace 6. When the temperature in the reactor has reached about 1,000-1,300 deg.C, Cl2 is supplied from the Cl2 pipe 4 and made to react with the above materials. The produced gas is discharged from the system through the produced gas discharge line 3. The produced gas is sampled at regular intervals through the sampling port 5 of the produced gas discharge line 3, and the CO2 content, etc. are determined. The feed rate of chlorine is controlled so as to keep the CO2 content of the produced gas to <=10vol%. When the CO2 content is out of the above range, COCl2 is produced by the unreacted Cl2 remaining in the produced gas, resulting in the lowering of the chlorine yield and the poor separability and purifiability of SiCl4.
Bibliography:Application Number: JP19830225124