FLUORINE-CONTAINING POLYAMIC ACID DERIVATIVE AND POLYIMIDE

PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid deriva...

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Bibliographic Details
Main Authors FUJISAKI KOUJI, NUMATA SHIYUNICHI, KANESHIRO TOKUYUKI
Format Patent
LanguageEnglish
Published 08.06.1985
Subjects
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