FLUORINE-CONTAINING POLYAMIC ACID DERIVATIVE AND POLYIMIDE
PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid deriva...
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Format | Patent |
Language | English |
Published |
08.06.1985
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Abstract | PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid derivative having a repeating unit shown by the formula I (Y1 and Y2 are -O-, group shown by the formula II, or formula III; Rf is perfluoroalkylene; X is alkyl, fluorinated alkyl, or halogen; R' is H, or alkyl; R is residue obtained after removal of two amino groups from diamine; m is 0- 3; n is 0-4). Or a polyimide having a repeating unit shown by the formula IV(Y1, Y2, Rf, X, R, m, and n are as shown in the formula I ). The polyamic acid has extremely improved solubility in solvents, a polar solvent such as DMSO, DMF, etc. may be used, and a widely used solvent such as THF, acetone, etc. may be used together, and in case of necessity only the widely used solvent may be used. |
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AbstractList | PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid derivative having a repeating unit shown by the formula I (Y1 and Y2 are -O-, group shown by the formula II, or formula III; Rf is perfluoroalkylene; X is alkyl, fluorinated alkyl, or halogen; R' is H, or alkyl; R is residue obtained after removal of two amino groups from diamine; m is 0- 3; n is 0-4). Or a polyimide having a repeating unit shown by the formula IV(Y1, Y2, Rf, X, R, m, and n are as shown in the formula I ). The polyamic acid has extremely improved solubility in solvents, a polar solvent such as DMSO, DMF, etc. may be used, and a widely used solvent such as THF, acetone, etc. may be used together, and in case of necessity only the widely used solvent may be used. |
Author | KANESHIRO TOKUYUKI NUMATA SHIYUNICHI FUJISAKI KOUJI |
Author_xml | – fullname: FUJISAKI KOUJI – fullname: NUMATA SHIYUNICHI – fullname: KANESHIRO TOKUYUKI |
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Notes | Application Number: JP19830211075 |
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Snippet | PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY COMPOSITIONS BASED THEREON DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING |
Title | FLUORINE-CONTAINING POLYAMIC ACID DERIVATIVE AND POLYIMIDE |
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