FLUORINE-CONTAINING POLYAMIC ACID DERIVATIVE AND POLYIMIDE

PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid deriva...

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Main Authors FUJISAKI KOUJI, NUMATA SHIYUNICHI, KANESHIRO TOKUYUKI
Format Patent
LanguageEnglish
Published 08.06.1985
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Abstract PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid derivative having a repeating unit shown by the formula I (Y1 and Y2 are -O-, group shown by the formula II, or formula III; Rf is perfluoroalkylene; X is alkyl, fluorinated alkyl, or halogen; R' is H, or alkyl; R is residue obtained after removal of two amino groups from diamine; m is 0- 3; n is 0-4). Or a polyimide having a repeating unit shown by the formula IV(Y1, Y2, Rf, X, R, m, and n are as shown in the formula I ). The polyamic acid has extremely improved solubility in solvents, a polar solvent such as DMSO, DMF, etc. may be used, and a widely used solvent such as THF, acetone, etc. may be used together, and in case of necessity only the widely used solvent may be used.
AbstractList PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat resistance, obtained from a tetracarboxylic acid derivative containing a fluorinated alkyl group and a diamine. CONSTITUTION:A polyamic acid derivative having a repeating unit shown by the formula I (Y1 and Y2 are -O-, group shown by the formula II, or formula III; Rf is perfluoroalkylene; X is alkyl, fluorinated alkyl, or halogen; R' is H, or alkyl; R is residue obtained after removal of two amino groups from diamine; m is 0- 3; n is 0-4). Or a polyimide having a repeating unit shown by the formula IV(Y1, Y2, Rf, X, R, m, and n are as shown in the formula I ). The polyamic acid has extremely improved solubility in solvents, a polar solvent such as DMSO, DMF, etc. may be used, and a widely used solvent such as THF, acetone, etc. may be used together, and in case of necessity only the widely used solvent may be used.
Author KANESHIRO TOKUYUKI
NUMATA SHIYUNICHI
FUJISAKI KOUJI
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Snippet PURPOSE:The titled polymer useful as a protecting film for semiconductors, multi-layer wiring film, etc. having improved water-vapor resistance and heat...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CHEMISTRY
COMPOSITIONS BASED THEREON
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
METALLURGY
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
PERFORMING OPERATIONS
PHYSICS
PRINTED CIRCUITS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
Title FLUORINE-CONTAINING POLYAMIC ACID DERIVATIVE AND POLYIMIDE
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