METHOD FOR INSPECTION OF POSITIONAL DEVIATION OF TRANSFER PATTERN AND TRANSFER PATTERN MASK

PURPOSE:To simplify the inspection for positional deviation of transfer patterns by a method wherein, when the adjoining unit patterns are transferred, positional detection marks are overlapped each other and an inspection is performed on the mark patterns formed as above. CONSTITUTION:An optical so...

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Bibliographic Details
Main Author DAN MASAHIRO
Format Patent
LanguageEnglish
Published 31.01.1984
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To simplify the inspection for positional deviation of transfer patterns by a method wherein, when the adjoining unit patterns are transferred, positional detection marks are overlapped each other and an inspection is performed on the mark patterns formed as above. CONSTITUTION:An optical source 6 and an image formation lens 7 are arranged on the upper and the lower sides of a reticle 1. A mask 8 is placed on an X-Y table 9. Then, after a reticle pattern has been transferred on the mask 8, the mask 8 is moved by one pitch by operating the table 9, and a transfer is performed on the position next to the previously transferred position. Between the adjoining unit patterns 10a and 10b, as a position detection mark 5 is transferred to a position detection mark 4 in an overlapped manner, the positional deviation of transferred patterns can be inspected by performing an inspection on the position detection mark pattern formed by performing above-mentioned procedures.
Bibliography:Application Number: JP19820127552